Ionex Corp.

advancing the future of new thin films with our turnkey phdp (pulsed high-density plasma)-magnetron source technology which includes a generator with proprietary pulsed output plus the enhanced magnetron. our source technology is application driven, market specific and retrofittable. this new technology is far superior to any magnetron equipped with a hipmis/hppms pulsed plasma generator (high power pulsed dc) in terms of plasma discharge stability, deposition rates, and film quality. ionex’s phdp-magnetron deposition source technology by design is focused on rate, scalability and superior film properties. our deposition technology offers the industrial market but not limited to a true alternative to arc deposition due to its high ionization and high deposition rates without reactive gas control producing dense, hard and smooth thin films without any macro-particles. the new technology also offers the semiconductor market but not limited to the ability to deposit low-stress dense fil