Specmat, Inc.

the room temperature wet chemistry growth (rtwcg) technology is a novel technology for growing highly uniform amorphous siox layers into silicon substrates. it can be broken down into two kinds of applications: as a chemical etchant and as a siox growth chemistry. for etching applications, the rtwcg formulation is adjusted to maximize the competitive siox etch rate so that it exceeds the oxide growth rate . for siox growth applications, the rtwcg formulation’s siox growth rate is optimized to exceed the competitive oxide etch rate . by varying the siox growth rate and/or the competitive etch-back rate, rtwcg siox growth solutions can be formulated to create siox thicknesses that range from no oxide to up to 5,000 angstrom (å) per a certain constant substrate etch-back. in pv, the rtwcg etch technology can be utilized in various ways such as: dead layer etching, surface etching for selective emitter applications, and as a junction isolation process. the siox growth technology can